Nanocrystalline titanium carbide thin films deposited by reactive magnetron sputtering

J. Musil; D. Hovorka; M. Mišina; A. J. Bell; V. Studnička

doi:10.1023/a:1022881307331

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Nanocrystalline titanium carbide thin films deposited by reactive magnetron sputtering

J. Musil D. Hovorka M. Mišina A. J. Bell V. Studnička

Year: 1998 Journal: Czechoslovak Journal of Physics Vol: 48 (8)Pages: 963-971 Publisher: Springer Science+Business Media

DOI: 10.1023/a:1022881307331

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Keywords:

Materials science Nanocrystalline material Thin film Crystallinity Methane Titanium Argon Substrate (aquarium) Sputtering Sputter deposition Titanium carbide Deposition (geology) Chemical engineering Cavity magnetron Analytical Chemistry (journal) Composite material Metallurgy Nanotechnology Chemistry Chromatography

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Metallurgical and Alloy Processes

Physical Sciences → Materials Science → General Materials Science

nanoparticles nucleation surface interactions

Physical Sciences → Earth and Planetary Sciences → Atmospheric Science

Nanocrystalline titanium carbide thin films deposited by reactive magnetron sputtering

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