Optimizing indium tin oxide thin films with bipolar d.c.-pulsed magnetron sputtering for electrochromic device applications

W. J. Lee; Yung-Chin Fang; Jyh‐Jier Ho; Cheng‐Yu Chen; Siyuan Chen; R.-Y. Tsai; D.R. Huang; F. C. Ho

doi:10.1023/a:1021504414559

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Optimizing indium tin oxide thin films with bipolar d.c.-pulsed magnetron sputtering for electrochromic device applications

W. J. Lee Yung-Chin Fang Jyh‐Jier Ho Cheng‐Yu Chen Siyuan Chen R.-Y. Tsai D.R. Huang F. C. Ho

Year: 2002 Journal: Journal of Materials Science Materials in Electronics Vol: 13 (12)Pages: 751-756 Publisher: Springer Science+Business Media

DOI: 10.1023/a:1021504414559

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Keywords:

Electrochromism Materials science Sputtering Indium tin oxide Transmittance Deposition (geology) Sputter deposition Optoelectronics Analytical Chemistry (journal) Electrochromic devices Electrical resistivity and conductivity Argon Tin Thin film Layer (electronics) Composite material Nanotechnology Metallurgy Electrode Chemistry Electrical engineering

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Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Optimizing indium tin oxide thin films with bipolar d.c.-pulsed magnetron sputtering for electrochromic device applications

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