PHOTOCATALYTIC TIO THIN FILMS FABRICATED BY DC REACTIVE MAGNETRON SPUTTERING

Abstract

Titanium dioxide thin films that were deposited by unbalanced DC reactive magnetron sputtering on glass substrates have a high crystal structure and large surfac especially getting the anatase phase at the fairly low temperature substrates T, = 446K . The films were charaterized by X-ray diffraction, attomic force AFM, UV-vis spectroscopy. The photocatalytic properties of TiO2 thin films were tested with the degradation methylene blue MB under UV light irradiation. The best fabricated photocatalytic TiOthin films were found with such parameters: gas ratio 0 Ar = 0,06; sputtering power P, = 275W (1p = 0,5 A; Vp = 550V); target - substrate distance h = 4cm; pressure p = 13 mtorr, film thickness d = 660 nm and substrate temperature Tg = 485 K. These films also have a reused probability several times without decreasing amount of Methylene Blue (MB) degradation.