Yen-Ming Tseng (9411108)Amal Narayanan (1531243)Kaushik Mishra (353412)Xinhao Liu (5477975)Abraham Joy (1579327)
Pressure-sensitive\nadhesives (PSAs) such as sticky notes and labels\nare a ubiquitous part of modern society. PSAs with a wide range of\npeel adhesion strength are designed by tailoring the bulk and surface\nproperties of the adhesive. However, designing an adhesive with strong\ninitial adhesion but showing an on-demand decrease in adhesion has\nbeen an enduring challenge in the design of PSAs. To address this\nchallenge, we designed alkoxyphenacyl-based polyurethane (APPU) PSAs\nthat show a photoactivated increase and decrease in peel strength.\nWith increasing time of light exposure, the failure mode of our PSAs\nshifted from cohesive to adhesive failure, providing residue-free\nremoval with up to 83% decrease in peel strength. The APPU-PSAs also\nadhere to substrates submerged underwater and show a similar photoinduced\ndecrease in adhesion strength.
Yen‐Ming TsengAmal NarayananKaushik MishraXinhao LiuAbraham Joy
John S. Andre (9383729)Najae Escoffery (14014601)Nathan W. Ulrich (4597084)Yuchen Wu (758853)Wen Guo (112664)Mengshijie Yang (8452953)John Myers (3446360)Zhan Chen (488787)
Kyle J. Arrington (1687561)Scott C. Radzinski (1831060)Kevin J. Drummey (3107352)Timothy E. Long (1428190)John B. Matson (1443253)
Hee Joong Kim (1618264)Kailong Jin (2745085)Jimin Shim (1618261)William Dean (7591142)Marc A. Hillmyer (1301541)Christopher J. Ellison (1281288)
John S. AndreNajae EscofferyNathan W. UlrichYuchen WuWen GuoMengshijie YangJohn N. MyersZhan Chen