Chao Wang (146527)Jun Jiang (149215)Xiaojie Chai (9416980)Jianwei Lian (9416983)Xiaobing Hu (817805)An Quan Jiang (9416986)
High\nreadout domain-wall currents in LiNbO<sub>3</sub> single-crystal\nnanodevices are attractive because of their application in a ferroelectric\ndomain wall random access memory (DWRAM) to drive a fast memory circuit.\nHowever, the wall current at a small read voltage would increase nonlinearly\nat a much higher write voltage, which could cause high energy consumption.\nHere, we resolved this problem by controlling the two-step domain\nforward growth within a ferroelectric mesa-like cell that was formed\nat the surface of an X-cut LiNbO<sub>3</sub> single crystal. The mesa-like\ncell contacts two side Pt/Ni electrodes that extend over the cell\nsurface by 90 nm for the generation of an in-plane inhomogeneous electric\nfield. The domain forward growth processes at first in the formation\nof an inclined charged 180° domain to span the in-plane electrode\ngap under a write voltage of 5 V in a large readout wall current,\nand then, the domain expands fully throughout the entire cell in the\nformation of a neutral 180° wall to reduce the wall current by\n10 times at a higher write voltage of 6 V. Meantime, the domain below\nthe mesa-like cell in an opposite orientation is unchanged to serve\nas the reference. A higher wall current at a lower read voltage and\na lower wall current at a higher write voltage can satisfy both requirements\nof low energy consumption and fast operation speeds for the DWRAM.
Chao WangJun JiangXiaojie ChaiJianwei LianXiaobing HuAnquan Jiang
Yangyang Zhang (608493)Myung-Geun Han (1467025)Joseph A. Garlow (6928763)Yueze Tan (6928766)Fei Xue (24567)Long-Qing Chen (537432)Paul Munroe (1794076)Nagarajan Valanoor (2273659)Yimei Zhu (1467046)
D. C. LupascuT. GranzowTh. Woike
Kab‐Jin KimY. YoshimuraWoo Seung HamRick ErnstYuushou HirataTian LiSanghoon KimTakahiro MoriyamaY. NakataniTeruo Ono
Zhihong LuP. B. VisscherW. H. Butler