Nanostructured SiGe thin Films Obtained Through MIC Processing

M. Lindorf; H. Rohrmann; G.L. Katona; Dezső L. Beke; Hans‐Fridtjof Pernau; M. Albrecht

doi:10.1016/j.matpr.2015.05.076

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Nanostructured SiGe thin Films Obtained Through MIC Processing

M. Lindorf H. Rohrmann G.L. Katona Dezső L. Beke Hans‐Fridtjof Pernau M. Albrecht

Year: 2015 Journal: Materials Today Proceedings Vol: 2 (2)Pages: 557-565 Publisher: Elsevier BV

DOI: 10.1016/j.matpr.2015.05.076

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Keywords:

Materials science Thermoelectric effect Crystallite Crystallization Microstructure Thin film Seebeck coefficient Annealing (glass) Germanium Sputter deposition Optoelectronics Grain size Sputtering Hall effect Doping Electrical resistivity and conductivity Phonon scattering Silicon Nanotechnology Thermal conductivity Composite material Chemical engineering Metallurgy Electrical engineering

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Advanced Thermoelectric Materials and Devices

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and interfaces

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Thermal properties of materials

Physical Sciences → Materials Science → Materials Chemistry

Nanostructured SiGe thin Films Obtained Through MIC Processing

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