JOURNAL ARTICLE

Atomic Layer Etching of SiO2 Utilizing Ultra-Low Electron Temperature Plasma

Junyoung ParkNayeon KimJung‐Eun ChoiY. K. YeoMin-Seok KimChang-Min LimBeom‐Jun SeoChin‐Wook Chung

Year: 2025 Journal:   ACS Applied Electronic Materials Vol: 7 (10)Pages: 4520-4528   Publisher: American Chemical Society
Keywords:
Etching (microfabrication) Plasma Materials science Layer (electronics) Plasma etching Electron Electron temperature Atomic physics Nanotechnology Physics

Metrics

1
Cited By
2.02
FWCI (Field Weighted Citation Impact)
68
Refs
0.75
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Plasma Diagnostics and Applications
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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