Temperature Influence on the Deposition of Nitrogen-Doped Silicon Carbide Polycrystalline Films

Abstract

Polycrystalline nitrogen-doped cubic silicon carbide (3C-SiC) thin films are grown on 2″ Si wafers by a low-pressure chemical vapor deposition (LPCVD) technique with the aim for them to be used as support and active materials in microelectronic devices for neural interfaces. The effect of deposition temperature on the structural, mechanical, and electrical properties is investigated. The growth rate is varying, from 1 μm/h to 14 μm/h, along with the deposition temperature. We show that the structural and electrical properties of polycrystalline SiC are modified when changing the deposition temperature. Films with resistivity as low as (10.0 ± 0.5) mΩ·cm, a low residual stress of (−397 ± 158) MPa, and a low root mean square surface roughness of (53 ± 19) nm are achieved. Accelerated aging tests in heated phosphate buffer solution (PBS) show an etching rate of less than 1 nm/day and a steady low electrical resistivity for 77 days, indicating that the nitrogen-doped polycrystalline SiC is a chemically stable material, capable of chronic stability in a saline electrolyte.