BOOK-CHAPTER

electron-beam direct-write lithography

Abstract

Citation: 'electron-beam direct-write lithography' in the IUPAC Compendium of Chemical Terminology, 5th ed.; International Union of Pure and Applied Chemistry; 2025. Online version 5.0.0, 2025. 10.1351/goldbook.09506 • License: The IUPAC Gold Book is licensed under Creative Commons Attribution-ShareAlike CC BY-SA 4.0 International for individual terms. Requests for commercial usage of the compendium should be directed to IUPAC.

Keywords:
Computer science

Metrics

0
Cited By
0.00
FWCI (Field Weighted Citation Impact)
1
Refs
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

Related Documents

JOURNAL ARTICLE

Direct write electron beam lithography: a historical overview

H. C. Pfeiffer

Journal:   Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Year: 2010
JOURNAL ARTICLE

High-current electron optical design for reflective electron beam lithography direct write lithography

M. A. McCordShinichi KojimaPaul PetricAlan D. BrodieJeff Sun

Journal:   Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena Year: 2010 Vol: 28 (6)Pages: C6C1-C6C5
© 2026 ScienceGate Book Chapters — All rights reserved.