F. Guzmán-OlivosLucas Patricio Hernández-SaraviaRonald NelsonMaria de los Angeles PerezFrancisco J. Villalobos
In this study, a systematic investigation of MoS2 nanostructure growth on a SiO2 substrate was conducted using a two-stage process. Initially, a thin layer of Mo was grown through sputtering, followed by a sulfurization process employing the CVD technique. This two-stage process enables the control of diverse nanostructure formations of both MoS2 and MoO3 on SiO2 substrates, as well as the formation of bulk-like grain structures. Subsequently, the addition of reduced graphene oxide (rGO) was examined, resulting in MoS2/rGO(n), where graphene is uniformly deposited on the surface, exposing a higher number of active sites at the edges and consequently enhancing electroactivity in the HER. The influence of the synthesis time on the treated MoS2 and also MoS2/rGO(n) samples is evident in their excellent electrocatalytic performance with a low overpotential.
Zihan ZhangLiguo WeiLishuang ZhaoYu ZhangHao-Qiang Bai
Wanmeng DongHui LiuXiaoxu LiuHaoyu WangXinru LiLejie Tian
KeWei WangJinshan TanZejia LuShuai ChenXilin SheHuawei ZhangDongjiang Yang
Wang LiGuihua LiuJingde LiYanji WangLuis Ricardez‐SandovalYongguang ZhangZisheng Zhang
Jyoti BadigerMaheswari ArunachalamRohini Subhash KanaseSuzan Abdelfattah SayedKwang‐Soon AhnSoon Hyung Kang