N-type In (or Al) doped Cu2O thin films by magnetron sputtering

A.S. Lakshmanan; Zachariah C. Alex; S.R. Meher

doi:10.1140/epjp/s13360-023-04846-w

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N-type In (or Al) doped Cu2O thin films by magnetron sputtering

A.S. Lakshmanan Zachariah C. Alex S.R. Meher

Year: 2024 Journal: The European Physical Journal Plus Vol: 139 (1) Publisher: Springer Science+Business Media

DOI: 10.1140/epjp/s13360-023-04846-w

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Keywords:

X-ray photoelectron spectroscopy Materials science Thin film Dopant Analytical Chemistry (journal) Sputter deposition Raman spectroscopy Spectroscopy Photoluminescence Scanning electron microscope Doping Sputtering Optoelectronics Optics Chemistry Nanotechnology Chemical engineering

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Copper-based nanomaterials and applications

Physical Sciences → Materials Science → Materials Chemistry

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

N-type In (or Al) doped Cu2O thin films by magnetron sputtering

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