L. ZaunerRainer HahnO. HunoldJ. RammS. KolozsváriP. PolcikH. Riedl
The impact of Si-segregates and varying deposition conditions on the structural and mechanical properties of sputter deposited, high-temperature oxidation-resistant Cr-Si-B2±z coatings is studied from ambient, to elevated temperatures. Overstoichiometric, AlB2-structured Cr-Si-B2±z thin films with Si-content up to 15 at.% were synthesized on Ti-6Al-4V by magnetron-sputtering using a substrate bias of −120 V. The enhanced surface diffusion promotes mechanically superior, (001)-oriented coatings with hardness of H∼30 GPa up to a Si-content of 3 at.%. Higher Si-concentrations result in significant hardness loss to H∼20 GPa, related to a bias-independent solubility-limit in the CrB2-structure and the formation of mechanically-weak Si grain-boundary segregates. The as-deposited hardness of all Cr-Si-B2±z compositions is maintained after annealing to 800 °C, despite the initiation of material recovery. A B/Cr-ratio-independent oxidation resistance up to 1400 °C is demonstrated, underlining a minimum Si-content of 8 at.% to form a stable SiO2-based scale. In line with the room-temperature hardness, increasing Si-contents are accompanied by decreasing fracture toughness, reducing from KIC∼2.9 (Cr0.28B0.72) to ∼1.7 MPa√m (Cr0.24Si0.10B0.66). High-temperature cantilever bending up to 800 °C revealed a brittle-to-ductile-like transition for Cr0.28B0.72, resulting in an increased fracture toughness of KIC∼3.3 MPa√m. Si-alloyed coatings show decreasing fracture resistance up to 400 °C, whereas beyond, Si-segregates enable high-temperature plasticity and thus a significantly increased damage tolerance.
Zauner, LukasHahn, RainerHunold, OliverRamm, JürgenKolozsvári, SzilárdPolcik, PeterRiedl-Tragenreif, Helmut
L. ZaunerRainer HahnOliver HunoldJürgen RammS. KolozsváriP. PolcikH. Riedl
L. ZaunerAndreas SteinerT. GlechnerA. BahrBenedict OttRainer HahnTomasz WójcikO. HunoldJ. RammS. KolozsváriP. PolcikPeter FelferH. Riedl
L. ZaunerAndreas SteinerT. GlechnerA. BahrBenedict OttRainer HahnTomasz WójcikOliver HunoldJürgen RammS. KolozsváriP. PolcikPeter FelferH. Riedl
Zauner, LukasSteiner, AndreasGlechner, ThomasBahr, Ahmed Adel IbrahimOtt, BenedictHahn, RainerWojcik, TomaszHunold, OliverRamm, JürgenKolozsvári, SzilárdPolcik, PeterFelfer, PeterRiedl-Tragenreif, Helmut