High-K Nanocomposite Zro2/Tio2 Thin Films Deposited by Chemical Beam Vapor Deposition for Dielectric Applications

Rashmi RANI; Md. Kashif Shamim; Seema Sharma; Estelle Wagner; William Maudez; Giacomo Benvenuti; Radheshyam Rai

doi:10.2139/ssrn.4178964

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High-K Nanocomposite Zro2/Tio2 Thin Films Deposited by Chemical Beam Vapor Deposition for Dielectric Applications

Rashmi RANI Md. Kashif Shamim Seema Sharma Estelle Wagner William Maudez Giacomo Benvenuti Radheshyam Rai

Year: 2022 Journal: SSRN Electronic Journal Publisher: RELX Group (Netherlands)

DOI: 10.2139/ssrn.4178964

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Keywords:

Nanocomposite Materials science Dielectric Chemical vapor deposition Thin film Combustion chemical vapor deposition High-κ dielectric Electron beam physical vapor deposition Deposition (geology) Physical vapor deposition Chemical engineering Nanotechnology Carbon film Optoelectronics

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Electrophoretic Deposition in Materials Science

Physical Sciences → Engineering → Electrical and Electronic Engineering

High-K Nanocomposite Zro2/Tio2 Thin Films Deposited by Chemical Beam Vapor Deposition for Dielectric Applications

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