Precursor solution concentration-dependent electrochemical properties of CoFe2O4 thin films

Vidyadevi A. Jundale; Abhijit A. Yadav

doi:10.1007/s10854-022-08798-2

ScienceGate Book Chapters

JOURNAL ARTICLE

Precursor solution concentration-dependent electrochemical properties of CoFe2O4 thin films

Vidyadevi A. Jundale Abhijit A. Yadav

Year: 2022 Journal: Journal of Materials Science Materials in Electronics Vol: 33 (24)Pages: 19612-19626 Publisher: Springer Science+Business Media

DOI: 10.1007/s10854-022-08798-2

Get Full-Text PDF Get Analytical Report

Keywords:

Thin film Materials science Analytical Chemistry (journal) Band gap Electrical resistivity and conductivity Electrochemistry Current density Mesoporous material Capacitance Electrode Nanotechnology Chemistry Catalysis Physical chemistry Optoelectronics Chromatography

Metrics

Cited By

0.54

FWCI (Field Weighted Citation Impact)

Refs

0.61

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Advancements in Battery Materials

Physical Sciences → Engineering → Electrical and Electronic Engineering

Magnetic Properties and Synthesis of Ferrites

Physical Sciences → Materials Science → Materials Chemistry

Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

Precursor solution concentration-dependent electrochemical properties of CoFe2O4 thin films

Metrics

Citation History

Topics

Related Documents

Physical and electrochemical characteristics of NiFe2O4 thin films as functions of precursor solution concentration

Substrate temperature dependent properties of sprayed CoFe2O4 ferrite thin films

Effect of precursor solution concentration on the properties of spin coated V2O5 thin films

Effect of Precursor Solution Concentration at Spincasting on Physical Properties of Polystyrene Ultra-Thin Films

Influence of Precursor Solution Concentration on Structure and Magnetic Properties of Zinc Oxide Thin Films