Efficient modulation of MoS2/WSe2 interlayer excitons via uniaxial strain

Abstract

Artificially stacked van der Waals heterostructures (vdWH) of two-dimensional (2D) atomic layers have attracted considerable attention due to substantial interactions between different layers. In particular, the strongly bound interlayer exciton (IX) within vdWH offers a platform for exploring fundamental physics as well as innovative device applications. However, to date, it remains a critical challenge to modulate the IX emission energy, limiting the achievement of high-performance spin-valleytronics and excitonic devices. Here, we report a simple strain engineering approach to efficiently modulate the MoS2/WSe2 IX via uniaxial strain. By encapsulating the vdWH within a flexible substrate, the applied mechanical strain could be effectively transferred to the lattice of vdWH during the mechanical bending process, leading to an unprecedent IX modulation range of 144 meV with a linear fitted gauge factor of 121.8 meV per 1% strain. Furthermore, we found that the gauge factor of IX in vdWH is larger than that of individual MoS2 and WSe2 intralayer excitons, further confirming that the observed IX originates from the momentum-indirect exciton between the K point of the MoS2 conduction band and the Γ point of the WSe2 valence band. Our study not only achieves a high vdWH IX modulation value using efficient strain engineering but also provides a route to investigate the evolution of band energy for various two-dimensional (2D) materials as well as their vertical vdWH.