JOURNAL ARTICLE

Batch Atomic Layer Deposition of HfO2 and ZrO2 Films Using Cyclopentadienyl Precursors

Pamela R. FischerDieter PierreuxGabriela DilliwayOlivier RouaultJacky SirugueP. M. Zagwijn

Year: 2008 Journal:   ECS Meeting Abstracts Vol: MA2008-02 (24)Pages: 1890-1890   Publisher: Institute of Physics

Abstract

Abstract not Available.

Keywords:
Atomic layer deposition Cyclopentadienyl complex Layer (electronics) Deposition (geology) Materials science Chemical engineering Layer by layer Chemistry Nanotechnology Geology Organic chemistry Catalysis Engineering

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Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Electron and X-Ray Spectroscopy Techniques
Physical Sciences →  Materials Science →  Surfaces, Coatings and Films
Copper Interconnects and Reliability
Physical Sciences →  Materials Science →  Electronic, Optical and Magnetic Materials

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