Batch Atomic Layer Deposition of HfO2 and ZrO2 Films Using Cyclopentadienyl Precursors

Pamela R. Fischer; Dieter Pierreux; Gabriela Dilliway; Olivier Rouault; Jacky Sirugue; P. M. Zagwijn

doi:10.1149/ma2008-02/24/1890

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Batch Atomic Layer Deposition of HfO2 and ZrO2 Films Using Cyclopentadienyl Precursors

Pamela R. Fischer Dieter Pierreux Gabriela Dilliway Olivier Rouault Jacky Sirugue P. M. Zagwijn

Year: 2008 Journal: ECS Meeting Abstracts Vol: MA2008-02 (24)Pages: 1890-1890 Publisher: Institute of Physics

DOI: 10.1149/ma2008-02/24/1890

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Abstract

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Keywords:

Atomic layer deposition Cyclopentadienyl complex Layer (electronics) Deposition (geology) Materials science Chemical engineering Layer by layer Chemistry Nanotechnology Geology Organic chemistry Catalysis Engineering

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Electron and X-Ray Spectroscopy Techniques

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Batch Atomic Layer Deposition of HfO2 and ZrO2 Films Using Cyclopentadienyl Precursors

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