JOURNAL ARTICLE
Soft Magnetic Properties of Fe-N and Fe-Si-N Thin Films Sputtered in (Ar+N/sub 2/) Plasma
T. TakahashiHirotake YamamoriT. ShimatsuH. KomabaT. Wakiyama
Year: 1990 Journal: International Conference on Magnetics Vol: 13 Pages: BA-BA
Keywords:
Materials science Plasma Sputtering Thin film Silicon Metallurgy Analytical Chemistry (journal) Nanotechnology Chemistry Physics
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Topics
Metal and Thin Film Mechanics
Physical Sciences → Engineering → Mechanics of Materials
Copper Interconnects and Reliability
Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials
Magnetic properties of thin films
Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics
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