JOURNAL ARTICLE
Crystallographic Silicon-Etching for Ultra-High Aspect-Ratio FinFET
Vladimir JovanovićTomislav SuligojLis K. Nanver
Year: 2008 Journal: ECS Meeting Abstracts Vol: MA2008-01 (16)Pages: 644-644 Publisher: Institute of Physics
Abstract
Abstract not Available.
Keywords:
Etching (microfabrication) Materials science Silicon Optoelectronics Nanotechnology
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Topics
Advancements in Semiconductor Devices and Circuit Design
Physical Sciences → Engineering → Electrical and Electronic Engineering
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
Integrated Circuits and Semiconductor Failure Analysis
Physical Sciences → Engineering → Electrical and Electronic Engineering
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