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BOOK-CHAPTER

Electron Beam Lithography (EBL)

Mélanie Auffan Catherine Santaella Alain Thiéry Christine Paillès Jérôme Rose Wafa Achouak Antoine Thill Armand Masion Mark R. Wiesner Jean‐Yves Bottero Florence Mouchet Périne Landois Floriane Bourdiol Isabelle Fourquaux Pascal Puech Emmanuel Flahaut Laury Gauthier Malgorzata J. Rybak-Smith Youngjun Song Michael J. Heller David R. Holmes Benjamin L. J. Webb Tong Sun Theresa S. Mayer Jeffrey S. Mayer Christine D. Keating Amitabha Ghosh Ilya V. Pobelov Chen Li Thomas Wandlowski Michael G. Helander Zhibin Wang Zheng‐Hong Lu Francesca Carpino Larry R. Gibson Dane A. Grismer Paul W. Bohn Nezih Pala Mustafa Karabiyik Alexandra E. Porter Eva McGuire Guoqiang Xie Alejandro López‐Bezanilla Stephan Roche Eduardo Cruz‐Silva Bobby G. Sumpter Vincent Meunier Michael J. Laudenslager Wolfgang M. Sigmund Neal A. Hall Chang‐Jin Kim Guoxing Wang Robert J. Greenberg Chimaobi Mbanaso Gregory Denbeaux Claire Coutris Erik J. Joner

Year: 2012 Pages: 718-740

DOI: 10.1007/978-90-481-9751-4_344

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Keywords:

Electron-beam lithography Lithography Materials science Cathode ray Electron Optics Optoelectronics Physics Nanotechnology Resist Nuclear physics

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Citation History

Topics

Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

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JOURNAL ARTICLE

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JOURNAL ARTICLE

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