Dry processing in microelectronics: towards low pressure plasma technology

JOURNAL ARTICLE

Year: 1991 Journal: Microelectronics Reliability Vol: 31 (5)Pages: 1055-1055 Publisher: Elsevier BV

DOI: 10.1016/0026-2714(91)90179-b

Keywords:

Microelectronics Plasma Materials science Engineering Nanotechnology Physics Nuclear physics

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