Photoresist Exposure Parameter Extraction From Refractive Index Change During Exposure

Young-Soo Sohn; Moon-Gyu Sung; Jin-Kyung Oh; Sung-Hwan Byun; Yeon-Un Jung; Hye-Keun Oh; Ilsin An; Kun-Sang Lee; In-Ho Park; Joon-Yeon Cho; Sang-Ho Lee

doi:10.1109/imnc.1998.729977

JOURNAL ARTICLE

Photoresist Exposure Parameter Extraction From Refractive Index Change During Exposure

Young-Soo Sohn Moon-Gyu Sung Jin-Kyung Oh Sung-Hwan Byun Yeon-Un Jung Hye-Keun Oh Ilsin An Kun-Sang Lee In-Ho Park Joon-Yeon Cho Sang-Ho Lee

Year: 1998 Pages: 81-81

DOI: 10.1109/imnc.1998.729977

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Keywords:

Photoresist Refractive index Materials science Extraction (chemistry) Index (typography) Multiple exposure Optics Optoelectronics Computer science Nanotechnology Chemistry Chromatography Physics

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Surface Roughness and Optical Measurements

Physical Sciences → Engineering → Computational Mechanics

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Photoresist Exposure Parameter Extraction From Refractive Index Change During Exposure

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