Characterization and Wettability of TiO&lt;sub&gt;2&lt;/sub&gt; Films Deposited by Mid-Frequency Magnetron Reactive Sputtering

Ying Cui; Hao Du; Soo Wohn Lee; Chao Sun; Li Shi Wen

doi:10.4028/0-87849-431-6.27

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Characterization and Wettability of TiO<sub>2</sub> Films Deposited by Mid-Frequency Magnetron Reactive Sputtering

Ying Cui Hao Du Soo Wohn Lee Chao Sun Li Shi Wen

Year: 2007 Materials science forum Pages: 27-30 Publisher: Trans Tech Publications

DOI: 10.4028/0-87849-431-6.27

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Keywords:

Materials science Wetting Characterization (materials science) Sputter deposition Sputtering High-power impulse magnetron sputtering Cavity magnetron Optoelectronics Metallurgy Composite material Nanotechnology Thin film

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nanoparticles nucleation surface interactions

Physical Sciences → Earth and Planetary Sciences → Atmospheric Science

Surface Roughness and Optical Measurements

Physical Sciences → Engineering → Computational Mechanics

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Characterization and Wettability of TiO<sub>2</sub> Films Deposited by Mid-Frequency Magnetron Reactive Sputtering

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