JOURNAL ARTICLE

Fabrication of Zero-Mode Waveguide by Ultraviolet Nanoimprint Lithography Lift-Off Process

Jun‐ichi WadaShou RyuYuji AsanoTaro UenoTakashi FunatsuTakao YukawaJun MizunoTakashi Tanii

Year: 2011 Journal:   Japanese Journal of Applied Physics Vol: 50 (6S)Pages: 06GK07-06GK07   Publisher: Institute of Physics

Abstract

Zero-mode waveguides for single-molecule fluorescence imaging were fabricated using a simple desktop UV nanoimprint lithography system. An array of 30- to 150-nm-diameter nanoholes was successfully fabricated in an aluminum layer on a thin quartz plate by the single-step lift-off process using the UV-curable resist NIAC 707. Using the nanoholes, we performed real-time single-molecule fluorescence imaging to visualize the cochaperonin GroES binding with and dissociating from the chaperonin GroEL immobilized within the nanoholes. The demonstration revealed that the fluorescence from the GroES binding with the GroEL was three times stronger than the fluorescence from the GroES undergoing Brownian motion, and the real-time single-molecule fluorescence imaging was feasible using the zero-mode waveguide fabricated by the UV nanoimprint lithography lift-off process.

Keywords:
Nanoimprint lithography Fabrication Materials science Ultraviolet Lithography Optoelectronics Lift (data mining) Zero mode Mode (computer interface) Next-generation lithography Photolithography Electron-beam lithography Nanotechnology Resist Physics Computer science

Metrics

3
Cited By
0.21
FWCI (Field Weighted Citation Impact)
22
Refs
0.62
Citation Normalized Percentile
Is in top 1%
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Citation History

Topics

Nanofabrication and Lithography Techniques
Physical Sciences →  Engineering →  Biomedical Engineering
Advancements in Photolithography Techniques
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Monoclonal and Polyclonal Antibodies Research
Health Sciences →  Medicine →  Radiology, Nuclear Medicine and Imaging

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