JOURNAL ARTICLE

Diffusion and permeation of He, Ne, Ar, Kr and D2 through silicon oxide thin films

Year: 1971 Journal:   Vacuum Vol: 21 (8)Pages: 359-360   Publisher: Elsevier BV
Keywords:
Permeation Silicon Diffusion Oxide Silicon oxide Thin film Materials science Chemistry Radiochemistry Analytical Chemistry (journal) Nanotechnology Optoelectronics Thermodynamics Chromatography Metallurgy Physics Membrane

Metrics

2
Cited By
0.00
FWCI (Field Weighted Citation Impact)
0
Refs
0.42
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Gas Sensing Nanomaterials and Sensors
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Transition Metal Oxide Nanomaterials
Physical Sciences →  Materials Science →  Polymers and Plastics

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