JOURNAL ARTICLE

Properties of epitaxial silicon layers on buried silicon nitride produced by ion implantation

Year: 1987 Journal:   Microelectronics Reliability Vol: 27 (4)Pages: 795-795   Publisher: Elsevier BV
Keywords:
Epitaxy Silicon Materials science Ion implantation Silicon nitride Optoelectronics Nitride Ion Nanotechnology Layer (electronics) Chemistry

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Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon and Solar Cell Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Advancements in Semiconductor Devices and Circuit Design
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
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