(Invited) Pure Anatase Phase Titanium Dioxide Thin Films Prepared by Mist Chemical Vapor Deposition Applying for Photocatalysis

Abstract

Pure anatase TiO2 thin films were successfully deposited on five kind of substrates including p-type silicon, AZO, ITO, glass, and quartz class substrates by mist CVD method. The deposited temperature to get the pure anatase TiO2 thin film was optimized at 400°C. The intertwined nanosheets structure of TiO2 thin films with uniformity were observed on all of different substrates. The deposited TiO2 thin films on five kind of substrates could be confirmed that the pure anatase TiO2 with the same dominant peak of (101) and crystallinity was significantly improved in order of p-type silicon, AZO, ITO, glass, and quartz glass substrates. The transmittance of TiO2 films on transparent substrates showed the high transmittance of over 65% in visible region. The pure anatase TiO2 film on AZO substrate with lowest roughness had the greater potential to apply in photocatalytic applications.