Y-Doped HfO2 Thin Films Grown by Injection MOCVD

Erwan Rauwel; C. Millon; F. Ducroquet; Bernard Pélissier; Marta D. Rossell; Johan Verbeeck; Gustaaf Van Tendeloo; Bernd Hollaender; S. Rushworth; Catherine Dubourdieu

doi:10.1149/ma2005-02/13/514

JOURNAL ARTICLE

Y-Doped HfO2 Thin Films Grown by Injection MOCVD

Erwan Rauwel C. Millon F. Ducroquet Bernard Pélissier Marta D. Rossell Johan Verbeeck Gustaaf Van Tendeloo Bernd Hollaender S. Rushworth Catherine Dubourdieu

Year: 2006 Journal: ECS Meeting Abstracts Vol: MA2005-02 (13)Pages: 514-514 Publisher: Institute of Physics

DOI: 10.1149/ma2005-02/13/514

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Keywords:

Metalorganic vapour phase epitaxy Doping Materials science Thin film Analytical Chemistry (journal) Optoelectronics Chemistry Nanotechnology Chromatography Epitaxy

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advancements in Semiconductor Devices and Circuit Design

Physical Sciences → Engineering → Electrical and Electronic Engineering

Ferroelectric and Negative Capacitance Devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Y-Doped HfO2 Thin Films Grown by Injection MOCVD

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