JOURNAL ARTICLE
New vapor deposited dielectric polymer thin films for electronic applications
Abstract
Initiated chemical vapor deposition (iCVD) is a solvent-free polymer thin film deposition process which can be used to produce high quality dielectric thin films with nanoscale control and circumvents thus these problems. This work demonstrates the versatility of the iCVD process in the field of electrical applications by some new application examples of iCVD coatings.
Keywords:
Chemical vapor deposition Dielectric Materials science Thin film Nanoscopic scale Polymer Deposition (geology) Nanotechnology Physical vapor deposition Carbon film Combustion chemical vapor deposition Optoelectronics Chemical engineering Composite material Engineering
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Topics
Advanced Sensor and Energy Harvesting Materials
Physical Sciences → Engineering → Biomedical Engineering
Copper Interconnects and Reliability
Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
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