Phosphorus- and boron-doped hydrogenated amorphous silicon films prepared using vaporized liquid cyclopentasilane

Takashi Masuda; Hideyuki Takagishi; Zhongrong Shen; Keisuke Ohdaira; Tatsuya Shimoda

doi:10.1016/j.tsf.2015.05.040

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Phosphorus- and boron-doped hydrogenated amorphous silicon films prepared using vaporized liquid cyclopentasilane

Takashi Masuda Hideyuki Takagishi Zhongrong Shen Keisuke Ohdaira Tatsuya Shimoda

Year: 2015 Journal: Thin Solid Films Vol: 589 Pages: 221-226 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2015.05.040

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Keywords:

Vaporization Substrate (aquarium) Silicon Deposition (geology) Materials science Amorphous solid Amorphous silicon Doping Dissolution Chemical vapor deposition Boron Chemical engineering Analytical Chemistry (journal) Decaborane Chemistry Crystalline silicon Nanotechnology Metallurgy Organic chemistry Optoelectronics

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Phosphorus- and boron-doped hydrogenated amorphous silicon films prepared using vaporized liquid cyclopentasilane

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