Atomic layer deposition of palladium thin film from palladium (II) hexafluoroacetylacetonate and ozone reactant

Yiming Zou; Jiahui Li; Chunyu Cheng; David Z.W. Wang; Amanda Jiamin Ong; Ronn Goei; Xianglin Li; Shuzhou Li; Alfred Iing Yoong Tok

doi:10.1016/j.tsf.2021.138955

JOURNAL ARTICLE

Atomic layer deposition of palladium thin film from palladium (II) hexafluoroacetylacetonate and ozone reactant

Yiming Zou Jiahui Li Chunyu Cheng David Z.W. Wang Amanda Jiamin Ong Ronn Goei Xianglin Li Shuzhou Li Alfred Iing Yoong Tok

Year: 2021 Journal: Thin Solid Films Vol: 738 Pages: 138955-138955 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2021.138955

Get Full-Text PDF Get Analytical Report

Keywords:

Palladium Silicon Materials science Atomic layer deposition Thin film Layer (electronics) Metal Chemical engineering Deposition (geology) Sapphire Platinum Inorganic chemistry Analytical Chemistry (journal) Catalysis Chemistry Nanotechnology Metallurgy Organic chemistry Optics

Metrics

Cited By

0.73

FWCI (Field Weighted Citation Impact)

Refs

0.72

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Catalytic Processes in Materials Science

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Atomic layer deposition of palladium thin film from palladium (II) hexafluoroacetylacetonate and ozone reactant

Metrics

Citation History

Topics

Related Documents

Atomic layer deposition of rhodium and palladium thin film using low-concentration ozone

The co-reactant role during plasma enhanced atomic layer deposition of palladium

Substrate‐Independent Palladium Atomic Layer Deposition

Plasma-Assisted Atomic Layer Deposition of Palladium

Area-selective atomic layer deposition of palladium