A binary monolayer on an elastic substrate may self-organize into ordered nanoscale phase patterns. Here we report a work of using a substrate strain field to guide the self-assembly process. The study shows that straining a substrate uniformly does not influence the pattern. However, a non-uniform strain field significantly influences the size, shape and distribution of self-assembled features. The study suggests a method of strain field design to make various monolayer patterns.
Amreen KhanManali JadhavNishant Kumar JainRajendra PrasadRohit Srivastava
Jin Z. ZhangZhong-lin WangJun LiuShaowei ChenGang-yu Liu
Yimei ZhuHiromi InadaAchim HartschuhShi LiAda Della PiaGiovanni CostantiniAmadeo L. Vázquez de PargaRodolfo MirandaAntoine BarbierCristian MocutaRachid BelkhouBharat BhushanJ. H. HooK. S. ParkR. BaskaranK. F. BöhringerWei LüMichael NosonovskyMoon‐Ho HamArdemis A. BoghossianJong Hyun ChoiMichael S. StranoAmy LangMaría Laura HabeggerPhilip MottaBharat BhushanThomas BachmannHermann WagnerDonald W. BrennerJian ChenNika ShakibaQingyuan TanYu SunJulia R. GreerM. LaverS. M. KhaledAlessandro ParodiEnnio TasciottiBakul C. DaveSarah B. LockwoodClaudia MusicantiPaolo GascoFritz VollrathAlexander BoothAndy C. McIntoshNovid BeheshtiRichard WalkerLars Uno LarssonAndrew CopestakeHyundoo HwangYoon‐Kyoung ChoJian ChenMichael ChuCláudia R. GordijoXiao Yu WuYu SunMathias KolleUllrich SteinerSzu‐Wen WangFrederik CeyssensRobert PuersXiaodong HanShengcheng MaoZe ZhangLei JiangLing LinRegina RaganVanni LughiCarlos DrummondMarina RuthsWeiqiang MuJ. B. KettersonPierre BeriniYa‐Pu ZhaoFengchao WangShaurya PrakashSimon J. HenleyJosé V. AnguitaS. Ravi P. SilvaMunish ChananaCintia MateoVerónica SalgueiriñoMiguel A. Correa‐DuarteSwastik KarSaikat TalapatraJavier Calvo FuentesJ. RivasM. Arturo López‐QuintelaSoichiro Tsuda
Klinkova, AnnaChoueiri, Rachelle M.Kumacheva, Eugenia