Plasma-implanted Ti-doped hematite photoanodes with enhanced photoelectrochemical water oxidation performance

Yong Peng; Qingdong Ruan; Jason Chun‐Ho Lam; Fanxu Meng; Chung‐Yu Guan; Shella Permatasari Santoso; Xingli Zou; Edward T. Yu; Paul K. Chu; Hsien‐Yi Hsu

doi:10.1016/j.jallcom.2021.159376

JOURNAL ARTICLE

Plasma-implanted Ti-doped hematite photoanodes with enhanced photoelectrochemical water oxidation performance

Yong Peng Qingdong Ruan Jason Chun‐Ho Lam Fanxu Meng Chung‐Yu Guan Shella Permatasari Santoso Xingli Zou Edward T. Yu Paul K. Chu Hsien‐Yi Hsu

Year: 2021 Journal: Journal of Alloys and Compounds Vol: 870 Pages: 159376-159376 Publisher: Elsevier BV

DOI: 10.1016/j.jallcom.2021.159376

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Keywords:

Nanoporous Materials science Hematite Water splitting Doping Charge carrier Semiconductor Annealing (glass) Photoelectrochemistry Chemical engineering Band gap Nanotechnology Electrochemistry Optoelectronics Photocatalysis Chemistry Metallurgy Electrode Catalysis

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Iron oxide chemistry and applications

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Mine drainage and remediation techniques

Physical Sciences → Environmental Science → Environmental Chemistry

Advanced Photocatalysis Techniques

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Plasma-implanted Ti-doped hematite photoanodes with enhanced photoelectrochemical water oxidation performance

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