Localized surface plasmon resonance breaking the photodetection limit of Si-based Schottky photodetector

Abstract

Nowadays, compound semiconductors are the main approach to detect mid-infrared (IR) light, such as HgCdTe and InAsSb, due to the bandgap tunability compared with Si. However, the epitaxy processes are expensive and energy-intensive. Also, compound devices are not compatible with Si-based IC manufacturing. To solve those problems, here, we apply inverted pyramid array structures (IPAS) to induce localized surface plasmon resonance (LSPR) for Si-based Schottky devices. While IR illuminates metal covered IPAS (metal-IPAS), the photo-electrons can accumulate photon energy repeatedly through IPAS induced LSPR. While the electron energy is large enough to overcome the Schottky barrier, so the photo-current is generated. Regarding device preparation and measurement, briefly, the IPAS were formed on n-type Si (n-Si) substrates through photolithography, dry etching, and wet etching. Afterward, 10-nm-thick Ag films and 100-nm-thick Ag grid anode were thermally deposited on the IPAS successively to form Schottky junctions. Finally, Al was thermally deposited on the back of n-Si wafers to be the cathode. After device fabrication, the devices were illuminated by a 4010 nm mid-IR pulse laser, generated from a 1064 nm pulse laser through an optical parametric generator. The photo-voltage of the device induced by the mid-IR was measured by an oscilloscope. Consequently, the oscilloscope showed a short pulse while the device was illuminated by the 4010 nm pulse laser. The rising time is 8 ns, and the amplitude is 10.2 mV. The result reveals that the metal-IPAS induced LSPR successfully detects mid-IR light with photon energy less than Schottky barrier height.