Abstract

This abstract reports the first results regarding the development of screen-printed curing type Cu paste suitable for low and high temperature passivated contact solar cells. Cu nanoparticles were encapsulated with a thin layer of polyvinylpyrrolidone (<; 5 nm) and screen printed on Indium-Tin oxide (ITO). The screen-printed samples were cured under vacuum conditions (<; 300 ppm O 2 ) at a range of curing temperatures (180 °C - 450 °C) and durations (15 min - 60 min). Cu pastes were investigated for their printability, microstructure at the metal-ITO interface and electrical (line, contact) resistances. The screen-printed Cu achieved excellent contact resistance values comparable to Ag contacts with best contact resistivity of 0.25 mΩ.cm 2 obtained by curing between 400 °C to 450 °C. The following investigations are ongoing: Contact resistance of Cu contacts to ITO at curing temperatures up to 950 °C. Contact resistance to Aluminum Zinc oxide (AZO) and line resistance of Cu at curing temperatures between 180 °C to 950 °C. Final results will be presented at the conference with critical insights with regards to development of low-cost copper screen printing for passivated contact solar cells.

Keywords:
Contact resistance Materials science Curing (chemistry) Screen printing Indium tin oxide Copper Nanotechnology Composite material Thin film Metallurgy Layer (electronics)

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Citation History

Topics

Silicon and Solar Cell Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Photovoltaic Systems and Sustainability
Physical Sciences →  Environmental Science →  Environmental Engineering
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