Screen-printed n-type industry solar cells with tunnel oxide passivated contact doped by phosphorus diffusion

Ying Zhou; Ke Tao; Shengzhong Liu; Rui Jia; Jianhui Bao; Shuai Jiang; Yufeng Sun; Sanchuan Yang; Qinqin Wang; Qiang Zhang; Songbo Yang; Yujia Cao; Hui Qu

doi:10.1016/j.spmi.2020.106720

JOURNAL ARTICLE

Screen-printed n-type industry solar cells with tunnel oxide passivated contact doped by phosphorus diffusion

Ying Zhou Ke Tao Shengzhong Liu Rui Jia Jianhui Bao Shuai Jiang Yufeng Sun Sanchuan Yang Qinqin Wang Qiang Zhang Songbo Yang Yujia Cao Hui Qu

Year: 2020 Journal: Superlattices and Microstructures Vol: 148 Pages: 106720-106720 Publisher: Elsevier BV

DOI: 10.1016/j.spmi.2020.106720

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Keywords:

Polycrystalline silicon Materials science Passivation Solar cell Silicon Diffusion Doping Chemical vapor deposition Crystallite Oxide Optoelectronics Analytical Chemistry (journal) Layer (electronics) Composite material Metallurgy Chemistry

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Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Semiconductor materials and interfaces

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Screen-printed n-type industry solar cells with tunnel oxide passivated contact doped by phosphorus diffusion

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