JOURNAL ARTICLE

Defect-Assisted Contact Property Enhancement in a Molybdenum Disulfide Monolayer

Sang‐Soo CheeJoo‐Hyoung LeeKayoung LeeMoon‐Ho Ham

Year: 2019 Journal:   ACS Applied Materials & Interfaces Vol: 12 (3)Pages: 4129-4134   Publisher: American Chemical Society

Abstract

Contact engineering for two-dimensional (2D) transition metal dichalcogenides (TMDCs) is crucial for realizing high-performance 2D TMDC devices, and most studies on contact properties of 2D TMDCs have mainly focused on Fermi level unpinning. Here, we investigated electrical and photoelectrical properties of chemical vapor deposition (CVD)-grown molybdenum disulfide (MoS2) monolayer devices depending on metal contacts, Ti/Pt, Ti/Au, Ti, and Ag, and particularly demonstrated the essential role of defects in MoS2 in contact properties. Remarkably, MoS2 devices with Ag contacts show a field-effect mobility of 12.2 cm2 V-1 s-1, an on/off current ratio of 7 × 107, and a photoresponsivity of 1020 A W-1, which are outstanding compared to similar devices with other metal contacts. These improvements are attributed to a reduced Schottky barrier height, thanks to the small work function of Ag and Ag-MoS2 orbital hybridization at the interface, which facilitates efficient charge transfer between MoS2 and Ag. Interestingly, X-ray photoelectron spectroscopic analysis reveals that Ag2S was formed in our defect-containing CVD-grown MoS2 monolayer, but such orbital hybridization is not observed in a nearly defect-free exfoliated MoS2. This distinction shows that defects existing in MoS2 enable Ag to effectively couple to MoS2 and correspondingly enhance multiple electrical and photoelectrical properties.

Keywords:
Molybdenum disulfide Monolayer Materials science Schottky barrier Work function Chemical vapor deposition Fermi level Nanotechnology Contact resistance Transition metal Optoelectronics Electron Layer (electronics) Catalysis Metallurgy Chemistry

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