Three-dimensional micropatterning of graphene by femtosecond laser direct writing technology

Abstract

The reduction and patterning of graphene oxides (GOs) have broad applications in gene transfection, cell differentiation control, etc. However, two-dimensional (2D) photoreduction technologies (such as UV lithography) fail to realize the three-dimensional (3D) reduction and patterning of GO, limiting its applications in 3D electronic device interconnection and 3D graphene organ-on-a-chip. Here we developed 3D reduction and patterning of GO by femtosecond laser direct writing (FsLDW) technology. FsLDW has been adopted for 3D structure fabrication and 2D/3D micropatterning of reduced GOs on GO films. We deem that this technology will advance GO in the evolution of future electronics.