Jianting LuZhaoqiang ZhengJiandong YaoWei GaoYu ZhaoYe XiaoJingbo Li
Abstract Silicon‐based electronic devices, especially graphene/Si photodetectors (Gr/Si PDs), have triggered tremendous attention due to their simple structure and flexible integration of the Schottky junction. However, due to the relatively poor light–matter interaction and mobility of silicon, these Gr/Si PDs typically suffer an inevitable compromise between photoresponsivity and response speed. Herein, a novel strategy for coupling 2D In 2 S 3 with Gr/Si PDs is demonstrated. The introduction of the double‐heterojunction design not only strengthens the light absorption of graphene/Si but also combines the advantages of the photogating effect and photovoltaic effect, which suppresses the dark current, accelerates the separation of photogenerated carriers, and brings photoconductive gain. As a result, In 2 S 3 /graphene/Si devices present an ultrahigh photoresponsivity of 4.53 × 10 4 A W −1 and fast response speed less than 40 µs, simultaneously. These parameters are an order of magnitude higher than pristine Gr/Si PDs and among the best values compared with reported 2D materials/Si heterojunction PDs. Furthermore, the In 2 S 3 /graphene/Si PD expresses outstanding long‐term stability, with negligible performance degradation even after 1 month in air or 1000 cycles of operation. These findings highlight a simple and novel strategy for constructing high‐sensitivity and ultrafast Gr/Si PDs for further optoelectronic applications.
Jianting LuJiandong YaoJiahao YanWei GaoLe HuangZhaoqiang ZhengMenglong ZhangJingbo Li
Long ChenZhenghan LiChaoyi Yan
Jianting LuZhaoqiang ZhengJiandong YaoWei GaoYe XiaoMenglong ZhangJingbo Li
Meifei ChenXiqiang ChenZiqiao WuZihao HuangWei GaoMengmeng YangYe XiaoYu ZhaoZhaoqiang ZhengJiandong YaoJingbo Li