JOURNAL ARTICLE

Solution processed boron doped indium oxide thin-film as channel layer in thin-film transistors

S. ArulkumarS. ParthibanGnanaprakash DharmalingamJang‐Yeon Kwon

Year: 2019 Journal:   Journal of Materials Science Materials in Electronics Vol: 30 (20)Pages: 18696-18701   Publisher: Springer Science+Business Media
Keywords:
Thin-film transistor Materials science Indium Thin film Amorphous solid Boron Dopant Oxide Boron oxide Surface roughness Oxide thin-film transistor Optoelectronics Layer (electronics) Doping Analytical Chemistry (journal) Nanotechnology Composite material Metallurgy Chemistry Crystallography

Metrics

13
Cited By
0.80
FWCI (Field Weighted Citation Impact)
25
Refs
0.74
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry
ZnO doping and properties
Physical Sciences →  Materials Science →  Materials Chemistry

Related Documents

© 2026 ScienceGate Book Chapters — All rights reserved.