Tuning the magnetic properties of electrochemically deposited Cu2O thin films by Fe incorporation

K. Ganesan; N. Anandhan; A. Amaliroselin; Rangasamy Thangamuthu; T. Marimuthu; R. Panneerselvam

doi:10.1007/s10854-019-01925-6

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Tuning the magnetic properties of electrochemically deposited Cu2O thin films by Fe incorporation

K. Ganesan N. Anandhan A. Amaliroselin Rangasamy Thangamuthu T. Marimuthu R. Panneerselvam

Year: 2019 Journal: Journal of Materials Science Materials in Electronics Vol: 30 (16)Pages: 15482-15492 Publisher: Springer Science+Business Media

DOI: 10.1007/s10854-019-01925-6

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Keywords:

Materials science Thin film Photoluminescence Analytical Chemistry (journal) Scanning electron microscope Dopant Band gap X-ray photoelectron spectroscopy Diamagnetism Doping Tin oxide Substrate (aquarium) Nanotechnology Nuclear magnetic resonance Optoelectronics Chemistry Composite material Magnetic field

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Copper-based nanomaterials and applications

Physical Sciences → Materials Science → Materials Chemistry

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Tuning the magnetic properties of electrochemically deposited Cu2O thin films by Fe incorporation

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