Bibekananda DasS.N. AcharyPrahallad Padhan
ZnO/La0.7Sr0.3MnO3 (LSMO) heterostructures with different ZnO thickness were grown on (001) oriented silicon (Si) substrates by using RF-magnetron sputtering. The x-ray diffraction confirmed that the ZnO was grown epitaxially on LSMO/Si. The out-of-plane lattice parameter (3.863 Å) of LSMO film on Si experience 0.6 % strain, while that of ZnO experience 0.07 %. The heterostructure shows paramagnetic to ferromagnetic transition around 300 K, relatively lower that the bulk LSMO. The electrical transport in the heterostructure is non-linear and exhibits a transition from insulator like-to-metal like behavior on decreasing temperature from 300 K to 10 K. The study of this heterostructure may provide useful information for the future development of Si based electronic devices using oxide materials.
Subhash ThotaKrishanu RoychowdhuryVishal ThakareSomesh Chandra GanguliZuhuang ChenEr‐Jia GuoSujit Das
A. RuotoloA. OropalloF. Miletto GranozioG. PepePaolo PernaU. Scotti di Uccio
M. ZieseA. SetzerI. VrejoiuBalaji BirajdarBrian J. RodriguezD. Hesse
Jun ZhangXingguo GaoSiqi WangLifang WangMA Jian-chun