R. RameshamT. RoppelCharles D. EllisB. F. Hajek
Abstract Free‐standing diamond thin films and as‐deposited thin films on a Si substrate, prepared by high‐pressure, microwave plasma assisted chemical vapor deposition from a CH4/H2 mixture, are analyzed by SEM, Raman spectroscopy, and XRD.
R. RameshamT. RoppelCharles D. EllisB. F. Hajek
Peter K. BachmannD. LeersDetlef Wiechert
Takashi KitaSeiji NagaharaTaneo Nishino
John KouvetakisAnashe BandariMichael ToddB. J. WilkensN. Cave