Preparation of Irregular Silica Nanoparticles by the Polymer Templating for Chemical Mechanical Polishing of Sapphire Substrates

Yue Dong; Hong Lei; Yi Chen; Wenqing Liu; Lei Xu; Tianxian Wang; Sanwei Dai

doi:10.1007/s11664-019-07248-w

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Preparation of Irregular Silica Nanoparticles by the Polymer Templating for Chemical Mechanical Polishing of Sapphire Substrates

Yue Dong Hong Lei Yi Chen Wenqing Liu Lei Xu Tianxian Wang Sanwei Dai

Year: 2019 Journal: Journal of Electronic Materials Vol: 48 (7)Pages: 4598-4606 Publisher: Springer Science+Business Media

DOI: 10.1007/s11664-019-07248-w

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Keywords:

Chemical-mechanical planarization Materials science Nanoparticle Sapphire Polymer X-ray photoelectron spectroscopy Chemical engineering Polishing Surface roughness Nanotechnology Composite material Optics

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Advanced Surface Polishing Techniques

Physical Sciences → Engineering → Biomedical Engineering

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Advanced machining processes and optimization

Physical Sciences → Engineering → Mechanical Engineering

Preparation of Irregular Silica Nanoparticles by the Polymer Templating for Chemical Mechanical Polishing of Sapphire Substrates

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Citation History

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