Vacancy diffusion barriers in TaON and Ta<sub>3</sub>N<sub>5</sub> water-splitting photocatalysts

Joshua J. Bown; Alister J. Page

doi:10.1039/c9ta02280e

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Vacancy diffusion barriers in TaON and Ta₃N₅ water-splitting photocatalysts

Joshua J. Bown Alister J. Page

Year: 2019 Journal: Journal of Materials Chemistry A Vol: 7 (21)Pages: 13029-13035 Publisher: Royal Society of Chemistry

DOI: 10.1039/c9ta02280e

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Abstract

First principles calculations reveal charge-dependent vacancy diffusion mechanisms in mixed anion photocatalytic materials.

Keywords:

Vacancy defect Diffusion Ion Materials science Photocatalysis Water splitting Chemical physics Charge (physics) Engineering physics Crystallography Chemistry Thermodynamics Physics Catalysis

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Advanced Photocatalysis Techniques

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Inorganic Chemistry and Materials

Physical Sciences → Chemistry → Inorganic Chemistry

Machine Learning in Materials Science

Physical Sciences → Materials Science → Materials Chemistry

Vacancy diffusion barriers in TaON and Ta₃N₅ water-splitting photocatalysts

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Vacancy diffusion barriers in TaON and Ta3N5 water-splitting photocatalysts

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