JOURNAL ARTICLE

Review of gallium oxide based field-effect transistors and Schottky barrier diodes

Zeng LiuPeigang LiYusong ZhiXiaolong WangXulong ChuWeihua Tang

Year: 2019 Journal:   Chinese Physics B Vol: 28 (1)Pages: 017105-017105   Publisher: IOP Publishing

Abstract

Gallium oxide (Ga2O3), a typical ultra wide bandgap semiconductor, with a bandgap of ∼ 4.9 eV, critical breakdown field of 8 MV/cm, and Baliga's figure of merit of 3444, is promising to be used in high-power and high-voltage devices. Recently, a keen interest in employing Ga2O3 in power devices has been aroused. Many researches have verified that Ga2O3 is an ideal candidate for fabricating power devices. In this review, we summarized the recent progress of field-effect transistors (FETs) and Schottky barrier diodes (SBDs) based on Ga2O3, which may provide a guideline for Ga2O3 to be preferably used in power devices fabrication.

Keywords:
Materials science Optoelectronics Schottky diode Diode Schottky barrier Power semiconductor device Band gap Gallium oxide Transistor Figure of merit Field-effect transistor Fabrication Semiconductor Wide-bandgap semiconductor Metal–semiconductor junction Gallium Voltage Electrical engineering Engineering

Metrics

143
Cited By
5.61
FWCI (Field Weighted Citation Impact)
216
Refs
0.97
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Ga2O3 and related materials
Physical Sciences →  Materials Science →  Electronic, Optical and Magnetic Materials
ZnO doping and properties
Physical Sciences →  Materials Science →  Materials Chemistry
GaN-based semiconductor devices and materials
Physical Sciences →  Physics and Astronomy →  Condensed Matter Physics

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