Maskless lithography based on digital micromirror device (DMD) and double sided microlens and spatial filter array

Duc-Hanh Dinh; Hung-Liang Chien; Yung-Chun Lee

doi:10.1016/j.optlastec.2019.01.001

ScienceGate Book Chapters

JOURNAL ARTICLE

Maskless lithography based on digital micromirror device (DMD) and double sided microlens and spatial filter array

Duc-Hanh Dinh Hung-Liang Chien Yung-Chun Lee

Year: 2019 Journal: Optics & Laser Technology Vol: 113 Pages: 407-415 Publisher: Elsevier BV

DOI: 10.1016/j.optlastec.2019.01.001

Get Full-Text PDF Get Analytical Report

Keywords:

Microlens Microfabrication Materials science Digital micromirror device Maskless lithography Lithography Optics Photoresist Optoelectronics Photolithography Nanotechnology Resist Layer (electronics) Fabrication Physics Lens (geology) Electron-beam lithography

Metrics

Cited By

2.27

FWCI (Field Weighted Citation Impact)

Refs

0.86

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Advanced optical system design

Physical Sciences → Engineering → Biomedical Engineering

Advanced Optical Imaging Technologies

Physical Sciences → Engineering → Media Technology

Electrowetting and Microfluidic Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Maskless lithography based on digital micromirror device (DMD) and double sided microlens and spatial filter array

Metrics

Citation History

Topics

Related Documents

Maskless Lithography Based on Digital Micro-Mirror Device (DMD) with Double Sided Microlens and Spatial Filter Array

The Principle and Development of Optical Maskless Lithography Based Digital Micromirror Device (DMD)

Maskless beam pen lithography based on integrated microlens array and spatial-filter array

Patterning of SU-8 resist with digital micromirror device (DMD) maskless lithography

Optical Proximity Corrections for Digital Micromirror Device-based Maskless Lithography