JOURNAL ARTICLE

Maskless lithography based on digital micromirror device (DMD) and double sided microlens and spatial filter array

Duc-Hanh DinhHung-Liang ChienYung-Chun Lee

Year: 2019 Journal:   Optics & Laser Technology Vol: 113 Pages: 407-415   Publisher: Elsevier BV
Keywords:
Microlens Microfabrication Materials science Digital micromirror device Maskless lithography Lithography Optics Photoresist Optoelectronics Photolithography Nanotechnology Resist Layer (electronics) Fabrication Physics Lens (geology) Electron-beam lithography

Metrics

48
Cited By
2.27
FWCI (Field Weighted Citation Impact)
24
Refs
0.86
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Advanced optical system design
Physical Sciences →  Engineering →  Biomedical Engineering
Advanced Optical Imaging Technologies
Physical Sciences →  Engineering →  Media Technology
Electrowetting and Microfluidic Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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