Electrochromic Properties of NiO_x Films Deposited by DC Magnetron Sputtering

Abstract

Nickel oxide (NiOx) films were deposited onto ITO-coated glass at room temperature by DC magnetron sputtering and the electrochromic properties were investigated. The effects of film thickness on structure, morphology, electrochemical and electrochromic properties of NiOx films were systematically studied. X-ray diffraction and scanning electron microscopy results indicate NiOx films have the polycrystalline structure and the crystallinity improves with the increase of thickness. In atomic force microscopy analysis, the surface roughness of NiOx films increases as the thickness increases and large roughness is obtained in the films of more than 300 nm. The electrochemical properties were measured by using conventional three-electrode configuration in 1 M LiClO4-PC electrolyte and all the samples show good cyclic stability. A transmittance modulation of 62% between colored and bleached state at 550 nm wavelength is obtained for 500 nm thick film and the high color efficiencies of more than 62 cm2C-1 are obtained in NiOx films. However, coloring and bleaching response times increase with the increase of thickness because of the larger depth of charge insertion/extraction. The results confirm that magnetron sputtering technology provides a feasibility for electrochromic devices with excellent electrochromic performance.