Bulk molybdenum field emitters by inductively coupled plasma etching

Ningli Zhu; Matthew T. Cole; W. I. Milne; Jing Chen

doi:10.17863/cam.6805

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Bulk molybdenum field emitters by inductively coupled plasma etching

Ningli Zhu Matthew T. Cole W. I. Milne Jing Chen

Year: 2016 Journal: Physical Chemistry Chemical Physics Vol: 18 (48)Pages: 33152-33157 Publisher: Royal Society of Chemistry

DOI: 10.17863/cam.6805

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Abstract

Processing conditions are herein explored for the etching of bulk Mo by inductively coupled plasma towards nano tip arrays for field electron emission applications.

Keywords:

Inductively coupled plasma Molybdenum Etching (microfabrication) Plasma Field electron emission Materials science Plasma etching Analytical Chemistry (journal) Inductively coupled plasma atomic emission spectroscopy Field (mathematics) Electron Nanotechnology Chemistry Environmental chemistry Metallurgy Physics Nuclear physics

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Bulk molybdenum field emitters by inductively coupled plasma etching

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