Facile fabrication of wafer-scale, micro-spacing and high-aspect-ratio silicon microwire arrays

Jimu Yan; Shaolong Wu; Xiongfei Zhai; Xiang Gao; Xiaofeng Li

doi:10.1039/c6ra19104e

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Facile fabrication of wafer-scale, micro-spacing and high-aspect-ratio silicon microwire arrays

Jimu Yan Shaolong Wu Xiongfei Zhai Xiang Gao Xiaofeng Li

Year: 2016 Journal: RSC Advances Vol: 6 (90)Pages: 87486-87492 Publisher: Royal Society of Chemistry

DOI: 10.1039/c6ra19104e

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Abstract

Wafer-scale Si microwires with micro-spacing and large aspect ratio are fabricated, and the underlying etching mechanisms are proposed.

Keywords:

Wafer Fabrication Materials science Aspect ratio (aeronautics) Etching (microfabrication) Silicon Optoelectronics Nanotechnology Scale (ratio) Wafer-scale integration

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Nanowire Synthesis and Applications

Physical Sciences → Engineering → Biomedical Engineering

Advancements in Semiconductor Devices and Circuit Design

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced MEMS and NEMS Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Facile fabrication of wafer-scale, micro-spacing and high-aspect-ratio silicon microwire arrays

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