Adsorption of <scp>iii</scp>/<scp>v</scp> ions (In(<scp>iii</scp>), Ga(<scp>iii</scp>) and As(<scp>v</scp>)) onto SiO2, CeO2 and Al2O3 nanoparticles used in the semiconductor industry

Xiangyu Bi; Paul Westerhoff

doi:10.1039/c6en00184j

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Adsorption of iii/v ions (In(iii), Ga(iii) and As(v)) onto SiO₂, CeO₂ and Al₂O₃ nanoparticles used in the semiconductor industry

Xiangyu Bi Paul Westerhoff

Year: 2016 Journal: Environmental Science Nano Vol: 3 (5)Pages: 1014-1026 Publisher: Royal Society of Chemistry

DOI: 10.1039/c6en00184j

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Abstract

The semiconductor industry annually uses thousands of tons of nanoparticles (NPs) in chemical mechanical polishing (CMP) processes.

Keywords:

Adsorption Ion Nanoparticle Materials science Semiconductor industry Chemical engineering Chemistry Nanotechnology Physical chemistry Organic chemistry Engineering

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Arsenic contamination and mitigation

Physical Sciences → Environmental Science → Environmental Chemistry

Analytical chemistry methods development

Physical Sciences → Chemistry → Analytical Chemistry

Extraction and Separation Processes

Physical Sciences → Engineering → Mechanical Engineering

Adsorption of iii/v ions (In(iii), Ga(iii) and As(v)) onto SiO₂, CeO₂ and Al₂O₃ nanoparticles used in the semiconductor industry

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